Array substrate and manufacture method thereof, liquid crystal panel and liquid crystal display screen

ABSTRACT

The present application provides a manufacture method of an array substrate, wherein the manufacture method comprises providing a substrate; sequentially forming a planarization layer, a first common electrode layer and a first insulation layer on the substrate; forming a metal line layer on the first insulation layer; depositing a second insulation layer on a second metal layer and the first insulation layer; forming a plurality of through holes in the second insulation layer; forming a second common electrode layer on the second insulation layer which is formed with the through holes. The present application further provides a liquid crystal panel and a liquid crystal display screen.

CROSS REFERENCE

This application claims the priority of Chinese Patent Application No.201610948550.5, entitled “Array substrate and manufacture methodthereof, liquid crystal panel and liquid crystal display screen”, filedon Oct. 26, 2016, the disclosure of which is incorporated herein byreference in its entirety.

FIELD OF THE INVENTION

The present invention relates to a manufacture field of the liquidcrystal panel, and more particularly to a manufacture method of an arraysubstrate, an array substrate, a liquid crystal panel and a liquidcrystal display screen.

BACKGROUND OF THE INVENTION

The liquid crystal display is the common skill in the modern display.With the development requirement of becoming thinner, lighter and havingcost control for the cell phone and tablet, the realization of theintegration of the touch panel part which is previously located outsideand the liquid crystal panel becomes more important. However, theembedded touch control introduces the electrodes and adds insulationlayers, which lead to the decrease of the construction space to resultin kinds of display issues due to the electric leakage.

SUMMARY OF THE INVENTION

The present invention provides a manufacture method of an arraysubstrate and an array substrate, in which a thickness of an insulationlayer between two common electrode layers to increase the capacitancevolume and to reduce kinds of display issues due to the electricleakage.

The present invention further provides a liquid crystal panel and aliquid crystal display screen.

The manufacture method of the array substrate comprises providing asubstrate;

sequentially forming a planarization layer, a first common electrodelayer and a first insulation layer on the substrate;

forming a metal line layer on the first insulation layer;

depositing a second insulation layer on a second metal layer and thefirst insulation layer;

forming a plurality of through holes in the second insulation layer;

forming a second common electrode layer on the second insulation layerwhich is formed with the through holes.

The step of forming the through holes in the second insulation layercomprises forming a photoresist layer,

forming a second common electrode layer pattern to the photoresist layerwith a patterning process, wherein the second common electrode layerpattern comprises a plurality of hollow areas;

etching the second insulation layer according to the second commonelectrode layer pattern to form the through holes in the secondinsulation layer corresponding to the hollow areas.

The step of forming the second common electrode layer on the secondinsulation layer which is formed with the through holes comprisesdepositing the electrode layer on the photoresist layer,

removing the electrode layer outside the through holes to form thesecond common electrode layer.

The step of removing the electrode layer outside the through holes toform the second common electrode layer comprises etching the electrodelayer outside the through holes; removing the photoresist layer.

The step of removing the electrode layer outside the through holes toform the second common electrode layer comprises removing thephotoresist layer with acetone reagent.

The step of removing the electrode layer outside the through holes toform the second common electrode layer comprises removing thephotoresist layer and the electrode layer on the photoresist layer witha half tone mask.

The substrate comprises a glass substrate, a gate electrode, a gateinsulation layer, a thin film transistor switch, an insulation layer anda first metal line which are sequentially formed on a surface of theglass substrate, and the planarization layer covers the first metal linelayer and the substrate exposing the first metal line.

The array substrate of the present application comprises a substrate, aplanarization layer, a first common electrode layer, a first insulationlayer, a metal line layer which are sequentially formed on thesubstrate, and a second insulation layer covering a second metal layerand the first insulation layer; the second insulation layer formed witha plurality of through holes; the plurality of through holes filled withan electrode material to form a second common electrode layer.

The liquid crystal panel of the present application comprises the arraysubstrate, a color film substrate and a liquid crystal layer sandwichedbetween the array substrate and the color film substrate.

The liquid crystal display screen of the present application comprisesthe liquid crystal panel.

The second common electrode layer in the array substrate of the presentinvention is located inside the through holes of the second insulationlayer to increase the storage capacitance and the parasitic capacitancefor reducing kinds of display issues due to the electric leakage.

BRIEF DESCRIPTION OF THE DRAWINGS

In order to more clearly illustrate the embodiments of the presentinvention or prior art, the following figures will be described in theembodiments are briefly introduced. It is obvious that the drawings aremerely some embodiments of the present invention, those of ordinaryskill in this field can obtain other figures according to these figureswithout paying the premise.

FIG. 1 is a flowchart of a manufacture method of an array substrateaccording to the present invention.

FIG. 2 is a specific step flowchart of step 5 in the manufacture methodof the array substrate shown in FIG. 1.

FIG. 3 is a diagram of an array of the present invention.

FIG. 4 is a diagram of a liquid crystal panel of the present invention.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

Embodiments of the present invention are described in detail with thetechnical matters, structural features, achieved objects, and effectswith reference to the accompanying drawings as follows. It is clear thatthe described embodiments are part of embodiments of the presentinvention, but not all embodiments. Based on the embodiments of thepresent invention, all other embodiments to those of ordinary skill inthe premise of no creative efforts obtained, should be considered withinthe scope of protection of the present invention.

Please refer to FIG. 3. The present invention provides an arraysubstrate 100 and a liquid crystal panel 200. The array substratecomprises a substrate 10, a planarization layer 20, a first commonelectrode layer 21, a first insulation layer 22, a metal line layer 23which are sequentially formed on the substrate 10, and a secondinsulation layer 24 covering a second metal layer 23 and the firstinsulation layer 22; the second insulation layer 24 formed with aplurality of through holes 241; the plurality of through holes 241filled with an electrode material to form a second common electrodelayer 25.

Please refer to FIG. 4. The liquid crystal panel 200 is employed in aliquid crystal display screen. The liquid crystal panel 200 comprisesthe array substrate 100, a color film substrate 210 and a liquid crystallayer 220 sandwiched between the array substrate 100 and the color filmsubstrate 210.

The second common electrode layer 25 in the array substrate of thepresent invention is deposited inside the through holes of the secondinsulation layer 24 to decrease the entire thickness of the firstinsulation layer 22 and the second insulation layer 24 to increase thestorage capacitance and the parasitic capacitance for reducing kinds ofdisplay issues due to the electric leakage.

Please refer to FIG. 1. The present invention further provides amanufacture method of an array substrate, and the manufacture methodcomprises:

step S1, providing a substrate 10;

step S2, sequentially forming a planarization layer 20, a first commonelectrode layer 21 and a first insulation layer 22 on the substrate;

step S3, forming a metal line layer 23 on the first insulation layer 22;

step S4, depositing a second insulation layer 24 on a second metal layer23 and the first insulation layer 22;

step S5, forming a plurality of through holes 241 in the secondinsulation layer 24;

step S6, forming a second common electrode layer 25 on the secondinsulation layer 24 which is formed with the through holes 241.

Please refer to FIG. 2. Furthermore, step S5 of forming the throughholes in the second insulation layer 24 comprises step S51 of forming aphotoresist layer on the second insulation layer.

step S52, forming a second common electrode layer pattern to thephotoresist layer with a patterning process, wherein the second commonelectrode layer pattern comprises a plurality of hollow areas.

step S53 of etching the second insulation layer 24 according to thesecond common electrode layer pattern to form the through holes 241 inthe second insulation layer 24 corresponding to the hollow areas.

In this embodiment, step S6 of forming the second common electrode layer25 on the second insulation layer 24 which is formed with the throughholes 241 comprises a step of depositing the electrode layer on thephotoresist layer;

and a step of removing the electrode layer outside the through holes 241to form the second common electrode layer 25.

In one embodiment of the present invention, the aforesaid step ofremoving the electrode layer outside the through holes 241 to form thesecond common electrode layer comprises etching the electrode layeroutside the through holes 241; this step is mainly to remove theredundant electrode layer and to preserve electrode material in thethrough holes to form the second common electrode layer 25, and then,removing the photoresist layer to expose the second common electrodelayer 25.

In another embodiment of the present invention, the step of removing theelectrode layer outside the through holes 241 to form the second commonelectrode layer comprises removing the photoresist layer with acetonereagent. Because the electrode layer is formed on the photoresist layerand formed in the through holes with the photoresist layer. Then,removing the photoresist layer can directly removing the electrode layeroutside the through holes 241, and thus to form the second commonelectrode layer 25.

In the third embodiment of the present invention, the step of removingthe electrode layer outside the through holes to form the second commonelectrode layer is to remove the photoresist layer and the electrodelayer on the photoresist layer with a half tone mask.

In this embodiment, the substrate 10 mainly comprises a glass substrate,a gate electrode, a gate insulation layer, a thin film transistorswitch, an insulation layer and a first metal line 15 which aresequentially formed on a surface of the glass substrate, and theplanarization layer covers the first metal line layer and the substrateexposing the first metal line. The specific position of the thin filmtransistor is determined according to the design requirement of thearray substrate, and the first metal line is a data line.

The array substrate of the present invention decreases the thickness ofthe insulation layer between the first common electrode layer 21 and thesecond common electrode layer 25 to increase the storage capacitance andthe parasitic capacitance for reducing kinds of display issues due tothe electric leakage.

Above are embodiments of the present invention, which does not limit thescope of the present invention. Any modifications, equivalentreplacements or improvements within the spirit and principles of theembodiment described above should be covered by the protected scope ofthe invention.

What is claimed is:
 1. A manufacture method of an array substrate,wherein the manufacture method comprises providing a substrate;sequentially forming a planarization layer, a first common electrodelayer and a first insulation layer on the substrate; forming a metalline layer on the first insulation layer; depositing a second insulationlayer on a second metal layer and the first insulation layer; forming aphotoresist layer; forming a second common electrode layer pattern tothe photoresist layer with a patterning process, wherein the secondcommon electrode layer pattern comprises a plurality of hollow areas;etching the second insulation layer according to the second commonelectrode layer pattern to form the through holes in the secondinsulation layer corresponding to the hollow areas; depositing theelectrode layer on the photoresist layer; and removing the electrodelayer outside the through holes to form the second common electrodelayer only located inside the through holes of the second insulationlayer.
 2. The manufacture method of the array substrate according toclaim 1, wherein the step of removing the electrode layer outside thethrough holes to form the second common electrode layer comprisesetching the electrode layer outside the through holes; removing thephotoresist layer.
 3. The manufacture method of the array substrateaccording to claim 1, wherein the step of removing the electrode layeroutside the through holes to form the second common electrode layercomprises removing the photoresist layer with acetone reagent.
 4. Themanufacture method of the array substrate according to claim 1, whereinthe step of removing the electrode layer outside the through holes toform the second common electrode layer comprises removing thephotoresist layer and the electrode layer on the photoresist layer witha half tone mask.
 5. The manufacture method of the array substrateaccording to claim 1, wherein the substrate comprises a glass substrate,a gate electrode, a gate insulation layer, a thin film transistorswitch, an insulation layer and a first metal line which aresequentially formed on a surface of the glass substrate, and theplanarization layer covers the first metal line layer and the substrateexposing the first metal line.
 6. An array substrate, comprising asubstrate, a planarization layer, a first common electrode layer, afirst insulation layer, a metal line layer which are sequentially formedon the substrate, and a second insulation layer covering a second metallayer and the first insulation layer; the second insulation layer formedwith a plurality of through holes; the plurality of through holes filledwith an electrode material to form a second common electrode layer onlylocated inside the through holes of the second insulation layer.
 7. Aliquid crystal panel, comprising the array substrate according to claim6, a color film substrate and a liquid crystal layer sandwiched betweenthe array substrate and the color film substrate.
 8. A liquid crystaldisplay screen, comprising the liquid crystal panel according to claim7.